Tungsten Hexafluoride (WF₆)

Tungsten Hexafluoride (WF₆) is a colorless, non-flammable gas used in the semiconductor industry. It serves as an etchant and chemical vapor deposition (CVD) precursor for depositing tungsten layers on silicon wafers. Key applications include interconnect formation in integrated circuits. Notable for its high purity and effectiveness in thin-film deposition processes.